
semi grade5 for 14nm and further technology node

| name | application |
| h2o2 | widely used in the semiconductor front wet cleaning process, including the cleaning of particles, metal impurities and organic residues |
| h2so4 | removing photoresist and other organic residues |
| nh4oh | removing water particle and cleaning polymer |
| nh4f·hf | etchant of silicon oxide used in wet etching process |
| hno3 | applied in water recycling and cleaning process |
| hci | applied in metal ion impurity removing process |
| c4h13no | applied in water thinning process and also universal developer of photoresist |

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technical:

hotline:4000-300655
address:168 shanfeng road, wuzhong district, suzhou

all rights:crystal clear electronic material co.,ltd.
technical: